Large Size Blanks :

‧Specifications

Film type
C
L
S
N
D
Optical Density
3.8±0.4
3.8±0.4
3.0±0.3
3.8±0.4
3.8±0.4
Reflectivity
(λ=436nm)
55%
10±5%
10±5%
10±5%
10±5%
Thickness

1000±100 Å
1250±125 Å
1000±100 Å
1250±100 Å
1550±150 Å
PR thickness
7000~10000±500 Å
Pinhole
Not limited < 5µm ; < 0.01pcs/cm2 as 6~10µm ;  Not allowed > 10µm
  Cr film type :
  C: Cr film          L: low reflective         D: double-side low reflective
  S: low reflective with thinner film      N: High adhesion
 
‧Sizes:
Cti can produce photomask blank up to 800*960mm. Here, some current available sizes are listed below.
Glass thickness 2.3t
350x350, 400x400.
Glass thickness 3.0t
203x203, 228.6x228.6, 254x304, 300x400, 340x340, 340x400, 350x350, 355.6x355.6, 400x400, 420x450.
Glass thickness 4.8t/5.0t
304.8x304.8, 355.6x355.6, 420x520, 420x530, 450x550, 508x609.6, 609.6x609.6, 609.6x709.
Glass thickness 7.8t/8.0t
700x800, 800x920, 800x960, 620x720.
Glass thickness 10t
520x800, 800x920.
 

‧Substrate materials: Quartz, Sodalime, B270
‧Resist available: TFT650, Az1500 (5000A°~10000A°)

 
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